As high-numerical aperture (NA) lithographic lenses have larger fields of view(FOVs) and nonuniform wavefront aberration distributions, this paper proposes an automatic optimized design method to reduce the the largest wavefront aberration of all FOVs in design processing. The method adds an external loop optimization procedure which can automatically adjust sampling weight into the local optimization procedure of a lithographic lens to balance wavefront aberrations and to reduce the largest wavefront aberration automatically. By using the proposed method, the uniformity of wavefront aberrations gets better and the largest wavefront aberration has been reduced to 63% of the primary value. It shows that the method has a better application in Code V. Meanwhile, it not only reduces the design time consumption but also the dependence on the design experiences of the designers. this method can also be applied in design of other optical systems with higher imaging quality.