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    Journals >Chinese Journal of Lasers >Volume 39 >Issue 9 >Page 908004 > Article
    • Chinese Journal of Lasers
    • Vol. 39, Issue 9, 908004 (2012)
    Study on Beam Stabilization Technique in Lithography Illumination System
    Bao Jianfei1、2、*, Huang Lihua1, Zeng Aijun1, Ren Bingqiang1, Yang Baoxi1, Peng Xuefeng1, Hu Xiaobang1, and Huang Huijie1
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl201239.0908004 Cite this Article Set citation alerts
    Bao Jianfei, Huang Lihua, Zeng Aijun, Ren Bingqiang, Yang Baoxi, Peng Xuefeng, Hu Xiaobang, Huang Huijie. Study on Beam Stabilization Technique in Lithography Illumination System[J]. Chinese Journal of Lasers, 2012, 39(9): 908004 Copy Citation Text show less
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    Bao Jianfei, Huang Lihua, Zeng Aijun, Ren Bingqiang, Yang Baoxi, Peng Xuefeng, Hu Xiaobang, Huang Huijie. Study on Beam Stabilization Technique in Lithography Illumination System[J]. Chinese Journal of Lasers, 2012, 39(9): 908004
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