[1] BAUMEISTER P. Bandpass filters for wavelength division multiplexing-modification of the spectral bandwidth[J]. Appl. Opt.,1998,37(28):6609-6614.

[2] VERLY P G. Accurate design of square bandpass interference filters[J]. SPIE, 1999,3738:262-267.

[3] MACLEOD A.Challenges in the design and production of narrow band filters for optical fiber telecommunications[J].SPIE,2000,4094:47-57.

[4] FABER R,ZHANG K Q.Design and manufacturing of WDM narrow band interference filters[J].SPIE,2000,4094:58-64.

[5] TONGQUN M,NANSHAN J,FANGCHE ZH. Development of DWDM filter manufacture[J].Optics and Precision Engineering,2001,9(5):488-494.

[6] MARTIN P J,MACLEOD H A,NETTERFIELD R P,et al.Ion beam assisted deposition of thin film[J]. Appl. Opt., 1983,22(1):178-184.

[7] DEMIRYONT H,SITES J R,GEIB K. Effect of oxygen content on the properties of tantalum oxide films deposited by ion beam sputtering[J]. Appl. Opt., 1985,24(10):490-495.

[8] TAKAHASHI H. Temperature stability of thin film narrow bandpass filters produced by ion assisted deposition[J]. SPIE,1994,2253:1343-1352.

[9] CHEN T CH,KUO J.Wei lung lee and Cheng chung lee. Influences of temperature and stress on transmission characteristics of multilayer thin film narrow bandpass filters[J]. Jpn. J.Appl.Phys.,2001,40:4087-4096.

[12] RASTOGI R, DHARMADHIKARI V,DIEBOLD A. Stress variation with temperature time and its correlation to film structure and deposition parameters[J]. J. Vac.Sci. Technol.,1991,A9(4):2453-2458.

[13] MURAKAMI M. Deformation in thin films by thermal strain[J]. J. Vac.Sci. technol.,1991,A9(4):2469-2476.

[15] TILSH M,SCHEUER V,TSCHUDI T. Effects of thermal annealing on ion beam sputtered SiO2 andTiO2 optical thin films[J]. SPIE,1997,3133:163-175.