• Chinese Journal of Lasers
  • Vol. 39, Issue 10, 1007002 (2012)
Chang Yanhe1、2、*, Jin Chunshui1, Li Chun1, and Jin Jingcheng1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl201239.1007002 Cite this Article Set citation alerts
    Chang Yanhe, Jin Chunshui, Li Chun, Jin Jingcheng. Optical Characterization and Structure Properties of Ultraviolet LaF3 Thin Films by Thermal Evaporation[J]. Chinese Journal of Lasers, 2012, 39(10): 1007002 Copy Citation Text show less
    References

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    [2] M. Bischoff, D. Gabler, N. Kaiser et al.. Optical and structural properties of LaF3 thin films[J]. Appl. Opt., 2008, 47(13): C157~161

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    [5] Y. Taki. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography[J]. Vacuum, 2004, 74(3-4): 431~435

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    [7] Liu Mingchung, Lee Chengchung, Kaneko Masaaki et al.. Microstructure and composition related characteristics of LaF3 thin films at 193 nm[J]. Opt. Engng., 2006, 45(8): 083801

    [8] T. Roland, H. Joerg, U. Hein et al.. Optical, structural, and mechanical properties of gadolinium tri-fluoride thin films grown on amorphous substrates[C]. SPIE, 2005, 5963: 59630O

    [9] W. Arens, D. Ristau, J. Ullmann et al.. Properties of fluoride DUV-Excimer laser optics: influence of the number of dielectric layers[C]. SPIE, 2000, 3902: 250~259

    [10] J. Ullmann, M. Mertin, Z. Carl et al.. Coated optics for DUV-excimer laser applications[C]. SPIE, 2000, 3902: 514~527

    [11] Yu Hua, Shen Yanming, Cui Yun et al.. Characterization of LaF3 coatings prepared at different temperatures and rates[J]. Appl. Surf. Sci., 2008, 254(6): 1783~1788

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    [14] Tang Jinfa, Gu Peifu, Liu Xu et al.. Modern Optical Thin Film Technology[M]. Hangzhou: Zhejiang University Press, 2006. 330~332

    [15] Chang Yanhe, Jin Chunshui, Li Chun et al.. Characterization of optical constants of ultraviolet LaF3 films by thermal evaporation[J]. Chinese J. Lasers, 2012, 39(8): 0807002

    [16] Guo Chun, Lin Dawei, Zhang Yundong et al.. Determination of optical constants of LaF3 films from spectrophotometric measurements[J]. Acta Optica Sinica, 2011, 31(7): 0731001

    [17] Liu Mingchung, Lee Chengchung, Kaneko Masaaki et al.. Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm[J]. Thin Solid Films, 2005, 492(1-2): 45~51

    CLP Journals

    [1] Chang Yanhe, Jin Chunshui, Li Chun, Jin Jingcheng. Laser Induced Damage of Fluoride Coatings at 193 nm[J]. Chinese Journal of Lasers, 2013, 40(7): 707001

    [2] [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei[J]. Acta Optica Sinica, 2013, 33(11): 1122002

    Chang Yanhe, Jin Chunshui, Li Chun, Jin Jingcheng. Optical Characterization and Structure Properties of Ultraviolet LaF3 Thin Films by Thermal Evaporation[J]. Chinese Journal of Lasers, 2012, 39(10): 1007002
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