• Acta Photonica Sinica
  • Vol. 31, Issue 12, 1479 (2002)
[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. THE EFFECT OF GROWTH RATE ON LP-MOCVD GaAs/Ge HETEROSTRUCTRUES[J]. Acta Photonica Sinica, 2002, 31(12): 1479 Copy Citation Text show less
    References

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    [2] Cotal H L,Lillington D R,Ermer J H,et al.Highly efficient 32.3% monolithic GaInP/GaAs/Ge tirple junction comcentrator solar cells.Program and Proceedings:NCPV Program Review Meeting 2000,16-19 April 2000:111~112

    [5] Kroemer H.Suppression of antiphase disorder in GaAs growth on relaxed GeSi buffers By metal-organic chemical vapor deposition.J Crystal Growth,(1987),81(2):193~197

    [6] Ringel S A,Sieg R M.Anti-phase domain-free GaAs on Ge substrate growth by MBE for space solar cell application.Proceedings of the 26th IEEE Photovoltaic Specialists Conference (IEEE,Anaheim,USA),1997,(3):793~797

    [7] Li Y,Salviati G M,Bongers M G,et al.On the formation of antiphase domains in the system of GaAs on Ge.J Cryst Growth (1996),163(2):195~202

    [8] McMahon W E,Olson J M.Atomic-resolution STM study of a structural phase transition of steps on vicinal As/Ge(100).Physical Review (B),1999,60(23):15999~16005

    [9] Timo G,Flores C.The effect of the growth rate on the low pressure metalorganic vapour epitaxy of GaAs/Ge heterostructures.J Crystal Growth,1992,125(3):440~448

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. THE EFFECT OF GROWTH RATE ON LP-MOCVD GaAs/Ge HETEROSTRUCTRUES[J]. Acta Photonica Sinica, 2002, 31(12): 1479
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