• Chinese Journal of Lasers
  • Vol. 36, Issue 11, 3045 (2009)
Deng Zechao*, Chu Lizhi, Ding Xuecheng, Li Yanli, Liang Weihua, Fu Guangsheng, and Wang Yinglong
Author Affiliations
  • [in Chinese]
  • show less
    DOI: 10.3788/cjl20093611.3045 Cite this Article Set citation alerts
    Deng Zechao, Chu Lizhi, Ding Xuecheng, Li Yanli, Liang Weihua, Fu Guangsheng, Wang Yinglong. Influence of Substrate to the Density-Reversion Time of Environment During Single Pulsed Laser Ablation[J]. Chinese Journal of Lasers, 2009, 36(11): 3045 Copy Citation Text show less

    Abstract

    Ablated particles and ambient gas atoms are assumed to be rigidity-spheres. In order to investigate the influence of substrate on the density-reversion time of environment,the propagation of Si particles generated by single pulsed laser ablation through ambient He gas with 1000 Pa is simulated via Monte Carlo method. The results show that the density-reversion time of the environment is 1713.2 μs and 1663.2 μs respectively when the Si particles are absorbed and rebounded completely by substrate. With increasing critical adsorbing velocities of the substrate,the density-reversion time firstly increases and then decreases.
    Deng Zechao, Chu Lizhi, Ding Xuecheng, Li Yanli, Liang Weihua, Fu Guangsheng, Wang Yinglong. Influence of Substrate to the Density-Reversion Time of Environment During Single Pulsed Laser Ablation[J]. Chinese Journal of Lasers, 2009, 36(11): 3045
    Download Citation