Researching | Improvement of Cavity Films and Catastrophic Optical Damage on 980 nm Semiconductor Laser

Journals >Chinese Journal of Lasers >Volume 35 >Issue s1 >Page 164 > Article

Chinese Journal of Lasers
Vol. 35, Issue s1, 164 (2008)

Improvement of Cavity Films and Catastrophic Optical Damage on 980 nm Semiconductor Laser

Lu Peng^*, Liu Guojun, Bo Baoxue, Wang yuxia, and Wang chongyang

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article Set citation alerts

Lu Peng, Liu Guojun, Bo Baoxue, Wang yuxia, Wang chongyang. Improvement of Cavity Films and Catastrophic Optical Damage on 980 nm Semiconductor Laser[J]. Chinese Journal of Lasers, 2008, 35(s1): 164 Copy Citation Text

show less

References

[5] B. C. Stuart, M. D. Feit, S. Herman et al.. Ultrashort-pulse optical damage[C]. SPIE, 2004, 5273: 1～7

CLP Journals

[1] Lin Tao, Duan Yupeng, Zheng Kai, Chong Feng, Ma Xiaoyu. High Power 657 nm Laser Diodes with Nonabsorbing Windows[J]. Chinese Journal of Lasers, 2009, 36(1): 104

Get PDF(in Chinese)

Figures&Tables (0)

Copy Citation Text

Lu Peng, Liu Guojun, Bo Baoxue, Wang yuxia, Wang chongyang. Improvement of Cavity Films and Catastrophic Optical Damage on 980 nm Semiconductor Laser[J]. Chinese Journal of Lasers, 2008, 35(s1): 164

Download Citation

Set citation alerts for the article

Set citation alerts for the article

Save the article for my favorites

Paper Information

Recommended Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology

Set citation alerts for the article

Please enter your email address