In order to improve the position deposition and morphology controlling of a single electrospun nanofiber in industrial applications,an electrospinning Direct-writing (DW) technology was studied further. Firstly, the DW technology based on the Near-Field Electrospinning (NFES) was utilized to investigate the deposition behavior of a single DW nanofiber on the flat silicon substrate. Then, the electrical field distribution above the patterned silicon substrate was simulated. Finally, patterned silicon substrate was used as a collector, and the effect of pattern structure and the motion speed of the collector on the position deposition of single DW nanofiber was analyzed.Experimental results demonstrate that the DW nanofiber with the diameter ranges from 100 nm to 800 nm can be deposited precisely on the top surface of a circle micro-pattern array with a diameter of 1.6 μm. When motion speed of the collector is lower than the electrospinning speed, the deposition location of DW nanofiber would deviate from the motion track and move from the pattern in 7 μm due to the electric field force. If the motion speed of the collector decreases further, more nanofiber would congregate around the micro pattern or on the top surface of pattern. The strip pattern plays an excellent guiding and restricting role on the deposition of single DW nanofiber. It is concluded that the DW technology based on NFES can provide a simple way for the precise position of single nanofibers on patterned silicon substrates.