• Chinese Journal of Lasers
  • Vol. 40, Issue 9, 907001 (2013)
Li Chun1、*, Jin Chunshui1, Jin Jingcheng1、2, and Chang Yanhe1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/cjl201340.0907001 Cite this Article Set citation alerts
    Li Chun, Jin Chunshui, Jin Jingcheng, Chang Yanhe. Realization of Antireflection Coatings for 193 nm P-Polarized Light at Large Angle[J]. Chinese Journal of Lasers, 2013, 40(9): 907001 Copy Citation Text show less

    Abstract

    The substrate and layer materials used for the antireflection coatings at 193 nm range are calculated and analyzed, and the deposition technique and parameters are carefully chosen and optimized. Based on these analyses the antireflection coatings for 193 nm light at large incident angle are designed, fabricated and tested. The results show that after coating, the residual reflection is lower than 1% and the single transmission of the coating is higher than 96% when the incident angle is 68°~72°. The single round trip energy loss of the linewidth narrowing module is calculated before coating and after coating, which confirms the necessity of this antireflection coating.
    Li Chun, Jin Chunshui, Jin Jingcheng, Chang Yanhe. Realization of Antireflection Coatings for 193 nm P-Polarized Light at Large Angle[J]. Chinese Journal of Lasers, 2013, 40(9): 907001
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