• Frontiers of Optoelectronics
  • Vol. 1, Issue 1, 123 (2008)
Shiyuan LIU*, Xiaojian WU, and Xinyi QIN
Author Affiliations
  • State Key Laboratory of Digital Manufacturing Equipment and Technology, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
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    DOI: 10.1007/s12200-008-0015-3 Cite this Article
    Shiyuan LIU, Xiaojian WU, Xinyi QIN. A real-time exposure dose control algorithm for DUV excimer lasers[J]. Frontiers of Optoelectronics, 2008, 1(1): 123 Copy Citation Text show less
    References

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    [2] Yu M L, Sagle A, Buller B. Exploring the fundamental limit of CD control: a model for shot noise in lithography. In: Proceedings of SPIE, 2005, 5751: 687-698

    [3] Inoue S, Fujisawa T, Izuha K. Effective exposure dose measurement in optical microlithography. In: Proceedings of SPIE, 2000, 3998: 810-818

    [4] Kivenzor G J. Self-sustaining dose control system: ways to improve the exposure process. In: Proceedings of SPIE, 2000, 4000: 835-842

    [5] Das P. Excimer laser as a total light source solution for DUV microlithography. In: Proceedings of SPIE, 2001, 4184: 323-329

    [6] Blumenstock GM, Meinert C, Farrar N R, et al. Evolution of light source technology to support immersion and EUV lithography. In: Proceedings of SPIE, 2005, 5645: 188-195

    [7] de Zwart G, van den BrinkMA, George R et al. Performance of a step-and-scan system for DUV lithography. In: Proceedings of SPIE, 1997, 3051: 817-835

    [8] Zschocke W, Albrecht H-S, Schroeder T, et al. High repetition rate excimer lasers for 193 nm lithography. In: Proceedings of SPIE, 2002, 4691: 1722-1733

    [9] van den Brink M A, Jasper H, Slonaker S, et al. Step-and-scan and step-and-repeat: a technology comparison. In: Proceedings of SPIE, 1996, 2726: 734-753

    Shiyuan LIU, Xiaojian WU, Xinyi QIN. A real-time exposure dose control algorithm for DUV excimer lasers[J]. Frontiers of Optoelectronics, 2008, 1(1): 123
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