• Chinese Journal of Lasers
  • Vol. 22, Issue 8, 367 (1995)
[in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]1, [in Chinese]1, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Cubic Boron Nitride Thin Films Prepared by Pulsed ArF Excimer Laser Deposition[J]. Chinese Journal of Lasers, 1995, 22(8): 367 Copy Citation Text show less

    Abstract

    Boron nitride thin films have been prepaied on the (100) surface of silicon substrate by the pulsed ArF excimer laser deposition (PLD) method. The structure and composition of the films have been measured by XRD, FTIR and AES, respectively. The results show that the films are cubic boron nitride (c BN) including small amount of hexagonal boron nitride (h BN). The highest value of Vickers microhardness of the films is about 1580 kg/mm2.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Cubic Boron Nitride Thin Films Prepared by Pulsed ArF Excimer Laser Deposition[J]. Chinese Journal of Lasers, 1995, 22(8): 367
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