• International Journal of Extreme Manufacturing
  • Vol. 2, Issue 4, 45104 (2020)
Zige Tian1、2, Xun Chen2, and Xipeng Xu1
Author Affiliations
  • 1Institute of Manufacturing Engineering, Huaqiao University, Xiamen, Fujian Province, People’s Republic of China
  • 2Faculty of Engineering and Technology, Liverpool John Moores University, Liverpool, United Kingdom
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    DOI: 10.1088/2631-7990/abc26c Cite this Article
    Zige Tian, Xun Chen, Xipeng Xu. Molecular dynamics simulation of the material removal in the scratching of 4H-SiC and 6H-SiC substrates[J]. International Journal of Extreme Manufacturing, 2020, 2(4): 45104 Copy Citation Text show less
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    Zige Tian, Xun Chen, Xipeng Xu. Molecular dynamics simulation of the material removal in the scratching of 4H-SiC and 6H-SiC substrates[J]. International Journal of Extreme Manufacturing, 2020, 2(4): 45104
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