Hui-Ping Liu, Xiu Zou. Effects of reflection of electrons and negative ions on magnetized electronegative and collisional plasma sheath [J]. Acta Physica Sinica, 2020, 69(2): 025201-1
- Acta Physica Sinica
- Vol. 69, Issue 2, 025201-1 (2020)
Fig. 1. Geometry of the electronegative magnetized plasma sheath model.电负性等离子体磁鞘模型示意图
Fig. 2. The effects of negative ions concentration and temperature on the lower limit of ion Mach number (
,
,
,
,
): (a) Boltzmannian model; (b) reflection model.
负离子浓度和温度对离子马赫数下限的影响(
,
,
,
,
) (a)玻尔兹曼模型; (b)反射模型
Fig. 3. The effect of wall potential on the lower limit of ion Mach number: (a) Whole; (b) part (
,
,
,
).
基板电势对离子马赫数下限的影响 (a)整体; (b)局部 (
,
,
,
)
Fig. 4. The effect of the sheath edge electric field on the lower limit of ion Mach number (
,
,
,
,
,
).
鞘边电场对离子马赫数下限的影响(
,
,
,
,
,
)
Fig. 5. The effect of collision parameter on the lower limit of ion Mach number (
,
,
,
,
,
).
碰撞参数对离子马赫数下限的影响(
,
,
,
,
,
)
Fig. 6. The effect of magnetic field angle on the lower limit of ion Mach number (
,
,
,
,
,
).
磁场角度对离子马赫数下限的影响(
,
,
,
,
,
)
Fig. 7. The normalized charged particle density (
).
鞘层中带电粒子密度分布(
)
Fig. 8. The normalized charged particle density (
).
鞘层中带电粒子密度分布(
)
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