In order to improve the voids phenomenon during filling the high-aspect-ratio nanograting structures using electroforming process, this paper uses the electrostatic adsorption principle of Janus green B molecule to eliminate the process defect by adding the leveling agent JGB to the electroforming bath. This paper completes the replication of nickel nanoimprint stamp on the flexible substrate via nanoimprint technology and electroforming process. In this process, the nanograting structures on the master silicon stamp are transferred to a polymer substrate using the hot embossing process to obtain soft template for embossing firstly; then, a seed layer of nickel is deposited on the polymer substrate nanostructure surface using sputtering process. The nanograting sructures are filled and the back plane of the replic is electroformed by electroforming process. Finally, the electroformed part and polymer are separated. Based on this process, a nickel nanoimprint stamp with six nano-grating areas of 1.3 mm×1.3 mm size, 201 nm pitch, 98 nm linewidth and 104 nm depth was replicated successfully. Compared with silicon master stamp, the error of the replicated stamp′s feature size is whthin 5%, the result shows good correlation between the dimensions of the replicated stamp′s features and the corresponding master stamp′s features. The pitch of the replicated stamp with grating structures has no error, the error of the linewidth is whthin 2% after hot-pressing process, the test result demonstrate that the mechanical strength of the replica is sufficient for the hot embossing process.