• NUCLEAR TECHNIQUES
  • Vol. 46, Issue 5, 050204 (2023)
Chaofei LIANG1、2, Wei LIU1, Dongxun ZHANG1、*, Wei WANG1, Jun WANG1、3, and Xiaobin XIA1、**
Author Affiliations
  • 1Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Shanghai Institute of Technology, Shanghai 201400, China
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    DOI: 10.11889/j.0253-3219.2023.hjs.46.050204 Cite this Article
    Chaofei LIANG, Wei LIU, Dongxun ZHANG, Wei WANG, Jun WANG, Xiaobin XIA. Study on the in-situ oxidation process of aluminizing layer formed on GH3535 superalloy[J]. NUCLEAR TECHNIQUES, 2023, 46(5): 050204 Copy Citation Text show less

    Abstract

    Background

    Under high-temperature operating conditions, the tritium would be generated inside the core of thorium-based molten salt reactor (TMSR) and probably diffuse through the structural material into the environment. Establishing an Al2O3/Ni-Al composite tritium permeation barrier coating may help address this issue.

    Purpose

    This study aims to explore the optimal preparation process, especially the in-situ oxidation process.

    Methods

    The Al2O3/Ni-Al composite coating was prepared on the surface of GH3535 alloy by pack cementation aluminizing (PCA) followed by vacuum in-situ oxidation, and the effects of oxidation temperature and vacuum on the microstructure of Al2O3 films were analyzed by experiments. Grazing incidence X-ray diffraction (GIXRD), scanning electron microscopy (SEM), and transmission electron microscope (TEM), X-ray energy dispersive spectroscopy (EDS) were used to characterize the phase composition and crystal structure of the alumina film, as well as morphologies of the surface and cross-section.

    Results

    The experimental results show that the low oxygen partial pressure can increase the forming temperature of alumina film, but can form a more compact film with flat surface. Higher oxidation temperature is conducive to the formation of thicker alumina films, but also greatly increases the surface defects.

    Conclusions

    By in-situ oxidation process at 1.2 Pa-850 ℃-72 h, alumina thin films with good properties can be obtained on the surface of GH3535 alloy: The phase of film contains γ and α, the thickness is about 0.8 μm, and the surface is compact without defects.

    Chaofei LIANG, Wei LIU, Dongxun ZHANG, Wei WANG, Jun WANG, Xiaobin XIA. Study on the in-situ oxidation process of aluminizing layer formed on GH3535 superalloy[J]. NUCLEAR TECHNIQUES, 2023, 46(5): 050204
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