• Chinese Journal of Lasers
  • Vol. 35, Issue 5, 698 (2008)
Wang Youwen1、2、*, Wen Shuangchun1, Hu Yonghua1, Zhang Lifu1, and Fu Xiquan1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    Wang Youwen, Wen Shuangchun, Hu Yonghua, Zhang Lifu, Fu Xiquan. Dependence of Nonlinear Hot Image of Intense Laser Beam on the Thickness of Kerr Medium[J]. Chinese Journal of Lasers, 2008, 35(5): 698 Copy Citation Text show less

    Abstract

    Dependence of the position and light intensity of nonlinear hot image in high power laser system on the thickness of Kerr medium has been investigated theoretically and numerically. Based on the propagation of angular spectrum and Bespalov-Talanov small-scale self-focusing theory, the expression for hot image intensity is obtained without thin medium approximation, and verified by numerical simulation. It is shown that, for a given obscuration, the hot image intensity increases monotonously with the medium thickness for a given input laser power, while it firstly increases to reach a maximum value, then decreases as the medium thickness increases for a given B integral. In addition, it is shown that the thin medium approximation is applicable to hot image analysis when the Fresnel number of an obscuration with respect to the length of the Kerr medium is much more than 1. The analytic results are in good agreement with numerical simulations.
    Wang Youwen, Wen Shuangchun, Hu Yonghua, Zhang Lifu, Fu Xiquan. Dependence of Nonlinear Hot Image of Intense Laser Beam on the Thickness of Kerr Medium[J]. Chinese Journal of Lasers, 2008, 35(5): 698
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