For the digital micromirror device (DMD) lithography equipment, due to the exposed images joint errors which caused by mechanical loading errors, problems such as misalignment and overlap of the exposed images may arise. In order to eliminate the exposure error of DMD during large-area exposure, the error correction method was studied. Firstly, the exposure error was got by measuring the exposed substrate with a microscope. Then, an error model was established based on the known exposure error. Finally, an error correction based on motion com-pensation for DMD lithography system was proposed based on the error model. This method is different from the existing error correction method. The experimental results show that during the micron image exposure process, the exposure error is reduced by more than 80%, and the DMD exposure center offset distance is reduced from 175 μm to 21 μm. The stitching accuracy of the exposed image is improved effectively, which meets the requirements for high quality and high precision of large-area exposure images.