• Opto-Electronic Engineering
  • Vol. 47, Issue 10, 200344 (2020)
Li Ende1、2、3, Yang Zeping1、2、3、*, Guan Chunlin1、2, Zhang Xiaojun1、2, Fan Muwen1、2, Shi Ningping1、2, Wei Ling1、2, and Long Guoyun1、2、3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.12086/oee.2020.200344 Cite this Article
    Li Ende, Yang Zeping, Guan Chunlin, Zhang Xiaojun, Fan Muwen, Shi Ningping, Wei Ling, Long Guoyun. Wavefront control technology for ICF facility in China[J]. Opto-Electronic Engineering, 2020, 47(10): 200344 Copy Citation Text show less

    Abstract

    In the high-power laser system for inertial confinement fusion, wavefront control is one of the key technologies for the laser system to ensure it operates safely and reaches the beam quality criteria. In this article, the development of the wavefront control technology from its first being putting forward for the ICF laser system to its application in the latest ICF laser system in China was introduced. During the development of the ICF facilities, the wavefront control methods are varying to satisfy the varied demands promoted by these facilities. Based on different facilities, the methods and the application results are illustrated, including the climbing wavefront method for far-field spot optimization, the full-facility wavefront control method based on the data fusion acquired from two wavefront sensors, and the full-system wavefront control method with bi-deformed mirrors in the rotation chamber laser structure.
    Li Ende, Yang Zeping, Guan Chunlin, Zhang Xiaojun, Fan Muwen, Shi Ningping, Wei Ling, Long Guoyun. Wavefront control technology for ICF facility in China[J]. Opto-Electronic Engineering, 2020, 47(10): 200344
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