• Chinese Journal of Lasers
  • Vol. 48, Issue 24, 2411001 (2021)
Zehao Lin, Runhua Li, Yinhua Jiang, and Yuqi Chen*
Author Affiliations
  • School of Physics and Optoelectronics, South China University of Technology, Guangzhou, Guangdong 510641, China
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    DOI: 10.3788/CJL202148.2411001 Cite this Article Set citation alerts
    Zehao Lin, Runhua Li, Yinhua Jiang, Yuqi Chen. Signal Enhancement in Target-Enhanced Orthogonal Double-Pulse Laser-Induced Breakdown Spectroscopy[J]. Chinese Journal of Lasers, 2021, 48(24): 2411001 Copy Citation Text show less
    Diagram of the experimental setup
    Fig. 1. Diagram of the experimental setup
    Temporal profiles of plasma emission of brass sample
    Fig. 2. Temporal profiles of plasma emission of brass sample
    Plot of signal intensity of Cu I 324.75 nm in target-enhanced orthogonal DP-LIBS versus delay time between two pulses
    Fig. 3. Plot of signal intensity of Cu I 324.75 nm in target-enhanced orthogonal DP-LIBS versus delay time between two pulses
    Emission spectra of plasma in SP-LIBS, orthogonal DP-LIBS, and target-enhanced orthogonal DP-LIBS
    Fig. 4. Emission spectra of plasma in SP-LIBS, orthogonal DP-LIBS, and target-enhanced orthogonal DP-LIBS
    Boltzmann plots of copper element for brass copper sample
    Fig. 5. Boltzmann plots of copper element for brass copper sample
    Lorentz fitting diagrams of Cu at 324.75 nm spectral line. (a) Orthogonal DP-LIBS; (b)target-enhanced orthogonal DP-LIBS
    Fig. 6. Lorentz fitting diagrams of Cu at 324.75 nm spectral line. (a) Orthogonal DP-LIBS; (b)target-enhanced orthogonal DP-LIBS
    Analytical lineEnhancement factor
    Compared with SP-LIBSCompared with orthogonal DP-LIBS
    Bi I 306.77 nm44.06.3
    Cu I 324.75 nm114.06.0
    Sn I 317.5 nm24.06.9
    Zn I 334.50 nm146.010.4
    Fe I 404.58 nm128.07.9
    Table 1. Enhancement factor of plasma emission intensity obtained in target-enhanced orthogonal DP-LIBS
    Wavelengthλ /nmTransition probabilityAij /(108 s-1)Degeneracy of the upper level giEnergy of the upper level Ei /eV
    330.79 (Cu I)1.38128.82
    465.11 (Cu I)0.3887.74
    510.55 (Cu I)0.0243.82
    515.32 (Cu I)0.6046.19
    521.82 (Cu I)0.7566.19
    Table 2. Spectroscopic parameters of copper atomic lines for plasma temperature calculation
    Zehao Lin, Runhua Li, Yinhua Jiang, Yuqi Chen. Signal Enhancement in Target-Enhanced Orthogonal Double-Pulse Laser-Induced Breakdown Spectroscopy[J]. Chinese Journal of Lasers, 2021, 48(24): 2411001
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