UV Laser MPI Spectra and TOF Mass Spectra of Tetramethylsilane

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 21 >Issue 1 >Page 44 > Article

Chinese Journal of Lasers
Vol. 21, Issue 1, 44 (1994)

UV Laser MPI Spectra and TOF Mass Spectra of Tetramethylsilane

[in Chinese]¹, [in Chinese]², [in Chinese]³, [in Chinese]³, [in Chinese]³, and [in Chinese]⁴

Author Affiliations

¹[in Chinese]

²[in Chinese]

³[in Chinese]

⁴[in Chinese]

show less

DOI: Cite this Article Set citation alerts

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. UV Laser MPI Spectra and TOF Mass Spectra of Tetramethylsilane[J]. Chinese Journal of Lasers, 1994, 21(1): 44 Copy Citation Text

show less

Abstract

It was studied that the MPI spectra and the TOF mass spectra of tetramethylsilane with parallel plate vacuum cell and supersonic molecular beam system with UV laser radiation in the wavelength range of 383 to 373 nm. In experiments, seven strong peaks of MPI spectra were gumed but only three were assigned to (2+1) ionization of Si atoms. TOF mass spectra showed that Si+ and constantly appeared.A general conclusion was gumed that the MPI machanism of tetramethylsilane was class B photochemical process.

Keywords

class A photochemical process class B photochemical process multiphoton ionization tetramethyisilane

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. UV Laser MPI Spectra and TOF Mass Spectra of Tetramethylsilane[J]. Chinese Journal of Lasers, 1994, 21(1): 44

Download Citation

Set citation alerts for the article

Tools

Set citation alerts for the article

Save the article for my favorites

Paper Information