• Chinese Journal of Lasers
  • Vol. 42, Issue 4, 415002 (2015)
Zhang Minjuan1、2、*, Wang Yanchao2, Wang Zhaoba1、3, Wang Zhibin1、2、3, and Wang Guoliang2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/cjl201542.0415002 Cite this Article Set citation alerts
    Zhang Minjuan, Wang Yanchao, Wang Zhaoba, Wang Zhibin, Wang Guoliang. Quality Factor Analysis of Photoelastic Modulation with Different Resonant State[J]. Chinese Journal of Lasers, 2015, 42(4): 415002 Copy Citation Text show less

    Abstract

    In order to improve the efficiency of photoelastic modulation under the high driving voltage, the spectral resolution of Fourier transform spectrometer is improved. Wasting model and vibration equation are established to describe the amplitude-frequency characteristics of photoelastic modulator, including the loss factors, and its quality factor is deduced under the condition of resonant frenquency matching and anti- resonant frenquency matching. The relationship between loss factors is analyzed under high dirving-voltage by combining electrostrictive effect and its loss of piezoelectric material, then anti-resonant frequency driving method is presented, whose quality factor and modulation depth are higher than resonant frequency driving method. Experimental results show that when the drive voltage is in the range of 500~1200 Vp- p, quality factor and modulation depth of anti- resonant frequency driving method can be improved 43% compared with resonant frenquency driving. Thus, anti-resonant frequency driving method can improve the efficiency of photoelastic modulation.
    Zhang Minjuan, Wang Yanchao, Wang Zhaoba, Wang Zhibin, Wang Guoliang. Quality Factor Analysis of Photoelastic Modulation with Different Resonant State[J]. Chinese Journal of Lasers, 2015, 42(4): 415002
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