Trimethylamine (TMA), TiCl4, and water are applied as the precursors to deposit Al2O3 and TiO2. With different substrate temperatures, the optical properties and surface morphologies of the two oxides TiO2 and SiO2 are studied, respectively. With substrate temperature of 120 oC, amorphous TiO2 can be obtained, and the surface roughness (RMS) is only 0.928 nm. Applying Al2O3 and TiO2 deposited in 120 oC as low and high refractive index materials, anti-reflection (AR) coating at single point (550 nm) is designed. Furthermore, with the calibrated growth rates, this AR coating is fabricated, and its ultimate reflectance for the AR coating at 550 nm is less than 0.2%, which can meet the requirement for most applications.