Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 24 >Issue 1 >Page 35 > Article

Chinese Journal of Lasers
Vol. 24, Issue 1, 35 (1997)

Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency[J]. Chinese Journal of Lasers, 1997, 24(1): 35 Copy Citation Text

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Abstract

A binary optics microlens array (BM) was fabricated by using ion beam teching. The real-time test of etching depth in vacuum enviroment was performed. A noval method of measuring the BM diffraction efficiency was presented.

Keywords

diffraction efficiency ion beam etching microlens array

[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency[J]. Chinese Journal of Lasers, 1997, 24(1): 35

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