Method to accurate calibrate deposition rates of EUV multilayer coatings

Lichao Zhang; Jinsong Gao

doi:10.3788/col201311.s10605

Journals >Chinese Optics Letters >Volume 11 >Issue s1 >Page S10605 > Article

Chinese Optics Letters
Vol. 11, Issue s1, S10605 (2013)

Method to accurate calibrate deposition rates of EUV multilayer coatings

Lichao Zhang and Jinsong Gao

DOI: 10.3788/col201311.s10605 Cite this Article Set citation alerts

Lichao Zhang, Jinsong Gao. Method to accurate calibrate deposition rates of EUV multilayer coatings[J]. Chinese Optics Letters, 2013, 11(s1): S10605 Copy Citation Text

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References

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[3] E. Spiller, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, A. M. Khounsary, (ed.) (SPIE Press, San Diego, 2003) p. 89.

[4] R. S. Rosen, D. G. Stearns, M. A. Viliardos, M. E. Kassner, S. P. Vernon, and Y. Cheng, Appl. Opt. 32, 6975 (1993).

[5] F. Wang, Z. Wang, J. Zhu, Z. Zhang, W. Wu, S. Zhang, and L. Chen, Chin. Opt. Lett. 4, 550 (2006).