With the continuous study of graphene, patterned graphene becomes the important requirement of graphene device application. The graphene patterned by femtosecond laser cutting is researched. The laser energy density and scanning speed influence the quality of graphene pattern, which is characterized by optical microscope and Raman spectrometer. The threshold of laser energy density for monolayer graphene and multilayer graphene are determined to be 1.0 J/cm2 and 0.8 J/cm2, respectively, while the optimal scanning speed is 100 mm/s. By analyzing the Raman spertra of residual graphene in the laser scanning area, the mechanism of laser cutting is considered to be oxidized ablation. Basing on the optimal laser parameters, the complex patterning of graphene is achieved by controlling the laser beam movement. The method mentioned in this study provides a powerful support for graphene devices.