• Journal of Advanced Dielectrics
  • Vol. 11, Issue 4, 2150019 (2021)
[in Chinese] and [in Chinese]*
Author Affiliations
  • Functional Materials Research Laboratory School of Materials Science & Engineering Tongji University, No. 4800 Cao’an Road Shanghai 201804, P. R. China
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    DOI: 10.1142/s2010135x21500193 Cite this Article
    [in Chinese], [in Chinese]. Dielectric tunable characteristics of compositional-gradient BaTi1–xSnxO3 thin films[J]. Journal of Advanced Dielectrics, 2021, 11(4): 2150019 Copy Citation Text show less

    Abstract

    Compositional-gradient BaTi1.xSnxO3 thin films on Pt(100)/Ti/SiO2/Si substrates are fabricated with sol–gel using spin coating. All of the structures of the prepared thin films are of single-phase crystalline perovskite with a dense and crack-free surface mor-phology. BTS10/15/20 thin film exhibits enhanced temperature stability in its dielectric behavior. The temperature coefficient of capacitance TCC20–150 in the temperature range from 20 °C to 150 °C is .0.9 × 10.4/ °C and that of TCC20–(–95) in the temperature range from 20 °C to .95 °C is .3.8 × 10.4/ °C. Furthermore, the thin films show low leakage current density and dielectric loss. High and stable dielectric tunable performances are found in BTS10/15/20 thin films: the dielectric tunability of the thin films is around 20.1% under a bias voltage of 8 V at 1 MHz and the corresponding dielectric constant is in the range between 89 and 111, which is beneficial for impedance matching in circuits. Dielectric tunability can be obtained under a low tuning voltage, which helps ensure safety. The simulated resonant frequency of the compositional-gradient BTS thin films depends on the bias electric field, showing compositional-gradient BTS thin films could be used in electrically tunable components and devices. These prop-erties make compositional-gradient BTS thin films a promising candidate for dielectric tuning.
    [in Chinese], [in Chinese]. Dielectric tunable characteristics of compositional-gradient BaTi1–xSnxO3 thin films[J]. Journal of Advanced Dielectrics, 2021, 11(4): 2150019
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