• Acta Physica Sinica
  • Vol. 68, Issue 10, 103101-1 (2019)
Dong-Yun Chen, Ming Gao, Yong-Hua Li, Fei Xu, Lei Zhao, and Zhong-Quan Ma*
DOI: 10.7498/aps.68.20190067 Cite this Article
Dong-Yun Chen, Ming Gao, Yong-Hua Li, Fei Xu, Lei Zhao, Zhong-Quan Ma. First principle study of formation mechanism of molybdenum-doped amorphous silica in MoO3/Si interface [J]. Acta Physica Sinica, 2019, 68(10): 103101-1 Copy Citation Text show less
The structure model of MoO3(010)/Si(100) interface: (a) Before theab initiomolecular dynamics; (b) after the ab initio molecular dynamics. The grey, blue and red balls stand for Mo atoms, Si atoms, and O atoms, respectivelyMoO3(010)/Si(100)分子动力学模型 (a)扩散反应前; (b)扩散反应后; 灰色球、蓝色球、红色球分别代表钼原子、硅原子和氧原子
Fig. 1. The structure model of MoO3(010)/Si(100) interface: (a) Before theab initiomolecular dynamics; (b) after the ab initio molecular dynamics. The grey, blue and red balls stand for Mo atoms, Si atoms, and O atoms, respectively MoO3(010)/Si(100)分子动力学模型 (a)扩散反应前; (b)扩散反应后; 灰色球、蓝色球、红色球分别代表钼原子、硅原子和氧原子
Adsorption configurations of MoO3 on Si (100) surface: (a) The optimized geometries of MoO3 molecule and reconstructed Si (100); (b)−(h) the adsorption configurations of MoO3 adsorbed on the different adsorption sites of Si (100) surface; (i) the difference charge density of MoO3 on the best adsorption site 7 of Si (100)MoO3在Si(100)不同吸附位点的结构示意图 (a) MoO3分子结构及重构后Si(100)表面形貌; (b)−(h) MoO3在吸附位点1−7时优化后的吸附模型; (i)最佳吸附位点7的差分电荷密度(黄色和绿色表示得失电子)
Fig. 2. Adsorption configurations of MoO3 on Si (100) surface: (a) The optimized geometries of MoO3 molecule and reconstructed Si (100); (b)−(h) the adsorption configurations of MoO3 adsorbed on the different adsorption sites of Si (100) surface; (i) the difference charge density of MoO3 on the best adsorption site 7 of Si (100) MoO3在Si(100)不同吸附位点的结构示意图 (a) MoO3分子结构及重构后Si(100)表面形貌; (b)−(h) MoO3在吸附位点1−7时优化后的吸附模型; (i)最佳吸附位点7的差分电荷密度(黄色和绿色表示得失电子)
The framework of α-SiO2 and α-MoO3 unit cellsα-SiO2和α-MoO3晶胞结构
Fig. 3. The framework of α-SiO2 and α-MoO3 unit cells α-SiO2α-MoO3晶胞结构
The formation energy for the two substitutional defects: (a) Si in place of a Mo in MoO3; (b) Mo in place of a Si in SiO2. The black curves stand for the bulk Si chemical potential and the red curves stand for the chemical potential for Si in the SiO2 under an oxygen-rich environment不同生长条件下替位杂质形成能 (a) Si替位Mo; (b) Mo替位Si; 黑线表示晶体硅的化学势, 红线表示富氧条件下硅的化学势
Fig. 4. The formation energy for the two substitutional defects: (a) Si in place of a Mo in MoO3; (b) Mo in place of a Si in SiO2. The black curves stand for the bulk Si chemical potential and the red curves stand for the chemical potential for Si in the SiO2 under an oxygen-rich environment 不同生长条件下替位杂质形成能 (a) Si替位Mo; (b) Mo替位Si; 黑线表示晶体硅的化学势, 红线表示富氧条件下硅的化学势
吸附位点1234567
吸附能Eab/eV –2.36–4.21–5.35–5.35–5.19–5.06–5.36
Table 1.

The adsorption energy of MoO3 on Si (100)

MoO3在Si(100)不同吸附位点的吸附能

结构参数
键长/Å键角/(°)
Mo—OIMo—OΠMo—OШOI —Mo— OΠOΠ—Mo—OШOШ—Mo—OI
吸附前1.731.731.73107.73107.74107.77
吸附后1.951.941.71125.62116.92116.11
Bader电荷/e
SiISiΠMoOIOΠOШ
吸附前3.883.983.916.726.676.71
吸附后3.073.214.147.367.356.72
Table 2.

The structure parameters and Bader charge of MoO3 adsorbed on the adsorption site 7 of Si (100) surface

吸附前后体系7结构参数变化及Bader电荷

Dong-Yun Chen, Ming Gao, Yong-Hua Li, Fei Xu, Lei Zhao, Zhong-Quan Ma. First principle study of formation mechanism of molybdenum-doped amorphous silica in MoO3/Si interface [J]. Acta Physica Sinica, 2019, 68(10): 103101-1
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