The method for measuring surface roughness by chromatic focal shift of optical system and its structure analysis

WU Yuhao; LI Xiangning; SUN Jinglu; SUN Hui

doi:10.3969/j.issn.1005-5630.2011.01.010

Journals >Optical Instruments >Volume 33 >Issue 1 >Page 42 > Article

Optical Instruments
Vol. 33, Issue 1, 42 (2011)

The method for measuring surface roughness by chromatic focal shift of optical system and its structure analysis

WU Yuhao, LI Xiangning, SUN Jinglu, and SUN Hui

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[in Chinese]

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DOI: 10.3969/j.issn.1005-5630.2011.01.010 Cite this Article

WU Yuhao, LI Xiangning, SUN Jinglu, SUN Hui. The method for measuring surface roughness by chromatic focal shift of optical system and its structure analysis[J]. Optical Instruments, 2011, 33(1): 42 Copy Citation Text

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References

[2] TAY C J,QUAN C G.A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering［J］.Optik,2003,114(1):1-6.

[6] SMITH W J.Modern Optical Engineering［M］.3rd ed.Carisbad:McGraw-Hill,2000:72-73.

WU Yuhao, LI Xiangning, SUN Jinglu, SUN Hui. The method for measuring surface roughness by chromatic focal shift of optical system and its structure analysis[J]. Optical Instruments, 2011, 33(1): 42

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