[1] JIN CH SH,WANG ZH SH, CAO J L. The design of soft X-ray projection lithography [J]. Opt. Precision Eng., 2000, 8(1): 66-70. (in Chinese)
[2] VLADIMIRSKY Y,TAYLOR J S,SOMMARGREN G E, et al.. Fabrication and testing of optics for EUV projection lithography[C]. Proc. SPIE 3331, 1998: 580-590.
[3] WANG L P. Optical system of extreme ultraviolet lithography [J]. Chinese J. Opt. Appl. Opt., 2010, 3(5): 452-461.(in Chinese)
[4] GLATZEL H,ASHWORTH D,BREMER M, et al.. Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5[C]. Proc. SPIE, 8679, 2013: 867917.
[5] JEONG H W,LAWRENCE G N,NAHM K B. Auto-alignment of a three-mirror off-axis telescope by reverse optimization and end-to-end aberration measurements [C]. In Current Developments in Optical Engineering II, Proc. SPIE 818, 1987: 419-430.
[6] HENRY N C, DONALD W S. Rigorous method for compensation selection and alignment of micro lithographic optical systems[C]. Proc. SPIE 3331,1998: 102-113.
[9] SEONGHUI K, HOSOON Y, YUN-WOO L, et al.. Merit function regression method for efficient alignment control of two-mirror optical systems [J]. Optics Express, 2007, 15(8):5059-5068.
[10] LEE J H,RYOO S,PARK K W, et al.. Development of a computer-aided alignment simulator for an EO/IR dual-band airborne camera [C]. Proc. SPIE 8417, 2012:84170E.
[12] LIU L, WANG Y, ZHANG X D. Computer-aided alignment based on DWC wave-front testing [J]. Laser and Infrared, 2013,43(4): 428-432. (in Chinese)
[14] CLAMPIN M C,BOS B J,HOWARD J M, et al.. Global alignment optimization strategies, procedures, and tools for the James Webb Space Telescope (JWST) Integrated Science Instrument Module (ISIM) [C]. SPIE 8442, 2012: 84423I.