Optical thin film damage induced by high intensity laser beams

Fan Zhengxiu

Journals >Chinese Journal of Lasers >Volume 9 >Issue 9 >Page 582 > Article

Chinese Journal of Lasers
Vol. 9, Issue 9, 582 (1982)

Optical thin film damage induced by high intensity laser beams

Fan Zhengxiu

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[in Chinese]

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Fan Zhengxiu. Optical thin film damage induced by high intensity laser beams[J]. Chinese Journal of Lasers, 1982, 9(9): 582 Copy Citation Text

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Abstract

It is found that the damage of thin film is induced mainly by some individual peaks of the laser pulses. The effect of thin film construction on the damage, and the action of SiO2 protecting coating in increasing the laser damage threshold of ZrO2/SiO2 film are analyzed.

Fan Zhengxiu. Optical thin film damage induced by high intensity laser beams[J]. Chinese Journal of Lasers, 1982, 9(9): 582

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