• Acta Photonica Sinica
  • Vol. 38, Issue 2, 302 (2009)
LI Xiao-gang1,* and TANG Xiao-dong2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    LI Xiao-gang, TANG Xiao-dong. Effects of Sputtering Parameters on Optical Constant of NiOx Thin Films*[J]. Acta Photonica Sinica, 2009, 38(2): 302 Copy Citation Text show less
    References

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    [2] PARK Y R, KIM K J. Sol–gel preparation and optical characterization of NiO and Ni1-xZnxO thin films[J]. J Crys Growth, 2003,258:380-384.

    [3] KAMAL H, ELMAGHRABY E K,ALI S A,et al. Characterization of nickel oxide films deposited at different substrate temperatures using spray pyrolysis[J]. J Cryst Growth, 2004,262:424-434.

    [4] FRANTA D, NEGULESCUA B, THOMASA L,et al. Optical properties of NiO thin films prepared by pulsed laser deposition technique[J]. Appl Surf Sci, 2005,244:426-430.

    [5] CHANG H, JENG T, CHEN J,et al.New write-once medium with NiOx film using blue laser[J]. Jpn J Appl Phys, 2005,44(8):6109-6112.

    [6] JIANG S R, FENG B X, YAN P X,et al. The effect of annealing on the electrochromic properties of microcrystalline NiOx films prepared by reactive magnetron rf sputtering[J]. Appl Surf Sci, 2001,174:125-131.

    [7] ZHOU Ying, GU Dong-hong, GENG Yong-you, et al.Thermal, structural and optical properties of NiOx thin films deposited by reactive dc-magnetron sputtering[J]. Mat Sci Eng B, 2006,135:125-128.

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    [9] POWELL R J,SPICER W E. Optical properties of NiO and CoO[J]. Phys Rev B, 1970,2(6):2182-2193.

    [10] SHEN Zhi-cai,SONG Yong-xiang,WANG Ying-jian,et al. Influence of inhomogeneities on the optical characteristics of single coatings[J]. Acta Photonica Sinica, 2005,34(10):1526-1529.

    [11] GU Zheng-tian, YIN Jin-long, LIANG Pei-hui,et al. Measurement of optical parameters of phthalocyanine LB films and spin-coated films[J]. Acta Photonica Sinica, 2000,29(7):663-668.

    [12] HU Xiao-yun.Influence of preparation technic of TiO2 sol-gel optical coatings on optical propeties[J]. Acta Photonica Sinica,1998,27(8):757-759.

    [13] ZHOU Ying, GENG Yong-you,GU Dong-hong. Effects of oxygen partial pressure on optical properties of NiOx films deposited by reactive DC-magnetron sputtering[J]. Chin Opt Lett, 2006,4(11):678-681.

    [14] HOTOVY I, LIDAY J, SPIESS L,et al. Study of annealed NiO thin Films sputtered on unheated substrate[J]. Jpn J Appl Phys, 2003,42(10A):1178-1181.

    [15] YANG Jiin-long, LAI Yi-sheng, CHEN J S. Effect of heat treatment on the properties of non-stoichiometric p-type nickle oxide films deposited by reactive sputtering[J]. Thin Solid Films, 2005,488:242-246.

    [16] SHAO Shu-ying, FAN Zheng-xiu, SHAO Jian-da,et al. Influence of oxgen partial pressure on the mechanical and optical properties of SiO2 films prepared by electron beam evaporation[J]. Acta Photonica Sinica, 2005,34(5):742-745.

    LI Xiao-gang, TANG Xiao-dong. Effects of Sputtering Parameters on Optical Constant of NiOx Thin Films*[J]. Acta Photonica Sinica, 2009, 38(2): 302
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