355 nm LaF3/MgF2 antireflection coatings were prepared by thermal boat evaporation combining masking technology. Some of these coatings were annealed in vacuum. The reflectance and transmittance spectra of the anti-reflective coatings were measured by a spectrophotometer Lambda 900. Meanwhile, the spectrum stability is tested. Laser induce damage threshold (LIDT) was performed by a 355 nm laser system with 8 ns pulses. The results show that the prepared anti-reflective coatings have very low reflectance and good spectrum stability. The vacuum annealing has no effect upon the LIDT. The damage morphologies are shown as dispersive spots. Moreover, the deep analysis shows that the damage origins from the defect at the film-substrate interfaces. The JGS1 substrate has better surface condition and higher laser damage resistance, and the antireflection coatings upon it has lower surface electric-field intensity. These advantages make the antireflection coatings on these substrates have higher LIDT.