DC discharge characteristics and fluorine atom yield in NF3/He

Liping Duo; Shukai Tang; Haijun Yu; Jian Wang; Xiangde Min; Liucheng Li; Yuqi Jin; Bailing Yang; Fengting Sang

Journals >Chinese Optics Letters >Volume 4 >Issue 3 >Page 03170 > Article

Chinese Optics Letters
Vol. 4, Issue 3, 03170 (2006)

DC discharge characteristics and fluorine atom yield in NF3/He

Liping Duo^*, Shukai Tang, Haijun Yu, Jian Wang..., Xiangde Min, Liucheng Li, Yuqi Jin, Bailing Yang and Fengting Sang|Show fewer author(s)

Author Affiliations

Short Wavelength Chemical Laser Laboratory, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023

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Liping Duo, Shukai Tang, Haijun Yu, Jian Wang, Xiangde Min, Liucheng Li, Yuqi Jin, Bailing Yang, Fengting Sang, "DC discharge characteristics and fluorine atom yield in NF3/He," Chin. Opt. Lett. 4, 03170 (2006) Copy Citation Text

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Abstract

DC discharge characteristics of NF3/He have been investigated experimentally under different experimental conditions, for example, different electrode materials, separations, flow rates of the gas NF3 or He, and series resistances. The optimum discharge parameters and the fluorine atom yield from the DC discharge of NF3/He as function of load power are studied experimentally.

Keywords

140.1340 140.1550 atomic gas lasers chemical lasers

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