The mulDamage characteristics of HfO2/SiO2 high reflector at 45&#176; incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu; Dawei Li; Yuan'an Zhao; Xiao Li; Xiulan Ling; Jianda Shao

doi:10.3788/COL20100801.0041

Journals >Chinese Optics Letters >Volume 8 >Issue 1 >Page 41 > Article

Chinese Optics Letters
Vol. 8, Issue 1, 41 (2010)

The mulDamage characteristics of HfO₂/SiO₂ high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu^1、2, Dawei Li¹, Yuan'an Zhao¹, Xiao Li^1、2, Xiulan Ling^1、2, and Jianda Shao¹

Author Affiliations

¹Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Graduate School of the Chinese Academy of Sciences, Beijing 100049, China

show less

DOI: 10.3788/COL20100801.0041 Cite this Article Set citation alerts

Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, Jianda Shao. The mulDamage characteristics of HfO₂/SiO₂ high reflector at 45° incidence in 1-on-1 and N-on-1 tests[J]. Chinese Optics Letters, 2010, 8(1): 41 Copy Citation Text

show less

Cited By

Article index updated: Feb. 24, 2023

Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.

The article is cited by 10 article(s) from Web of Science.

Download Citation

Set citation alerts for the article

Tools

Set citation alerts for the article

Save the article for my favorites

Paper Information