• Optoelectronics Letters
  • Vol. 13, Issue 6, 419 (2017)
Fei-fei XIN*
Author Affiliations
  • College of Physics and Materials Science, Tianjin Normal University, Tianjin 300387, China
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    DOI: 10.1007/s11801-017-7183-6 Cite this Article
    XIN Fei-fei. The mechanism of the UV band edge photorefractivity suppression in highly doped LiNbO3:Zr crystals[J]. Optoelectronics Letters, 2017, 13(6): 419 Copy Citation Text show less

    Abstract

    The ultraviolet (UV) band edge photorefractivity of LiNbO3:Zr at 325 nm has been investigated. The experimental results show that the resistance against photorefraction at 325 nm is quite obvious but not as strong as that at 351 nm, when the doping concentration of Zr reaches 2.0 mol%. It is reported that the photorefractivity in other tetravalently doped LiNbO3 crystals, such as LiNbO3:Hf and LiNbO3:Sn, is enhanced dramatically with doping concentration over threshold. Here we give an explicit explanation on such seemly conflicting behaviors of tetravalently doped LiNbO3, which is ascribed to the combined effect of increased photoconductivity and the absorption strength of the band edge photorefractive centers.
    XIN Fei-fei. The mechanism of the UV band edge photorefractivity suppression in highly doped LiNbO3:Zr crystals[J]. Optoelectronics Letters, 2017, 13(6): 419
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