Researching

Journals
  • Advanced Photonics
  • Photonics Insights
  • Advanced Photonics Nexus
  • Photonics Research
  • Advanced Imaging
  • View All Journals
  • Chinese Optics Letters
  • High Power Laser Science and Engineering
    • Articles
  • Optics
  • Physics
  • Geography
  • View All Subjects
    • Conferences
  • CIOP
  • HPLSE
  • AP
  • View All Events
    • News
    About CLP
    Search by keywords or author
    Journals >Chinese Journal of Lasers >Volume 9 >Issue 5 >Page 82 > Article
    • Chinese Journal of Lasers
    • Vol. 9, Issue 5, 82 (1982)
    Study on elliptical polorarizing light or IC strips under intense laser irradiation
    Li Yuanheng1 and Wang Zhenming2
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    DOI: Cite this Article Set citation alerts
    Li Yuanheng, Wang Zhenming. Study on elliptical polorarizing light or IC strips under intense laser irradiation[J]. Chinese Journal of Lasers, 1982, 9(5): 82 Copy Citation Text show less

    Abstract

    Abstract
    Get PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (0)
    Get Citation
    Copy Citation Text
    Li Yuanheng, Wang Zhenming. Study on elliptical polorarizing light or IC strips under intense laser irradiation[J]. Chinese Journal of Lasers, 1982, 9(5): 82
    Download Citation
    Set citation alerts for the article
    Tools
    Share
    Set citation alerts for the article
    Save the article for my favorites
    Paper Information
    Recommended Topics
    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology