• Acta Photonica Sinica
  • Vol. 35, Issue 8, 1194 (2006)
Zhu Huiqun1、*, Ding Ruiqin1, and Hu Yi2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    Zhu Huiqun, Ding Ruiqin, Hu Yi. Hydrogen Passivation Effect on GaAs Thin Films[J]. Acta Photonica Sinica, 2006, 35(8): 1194 Copy Citation Text show less

    Abstract

    13~20 nm monolayer high quality GaAs thin films have been deposited by radio frequency (RF) magnetron sputtering technique in the atmosphere with hydrogen. The effect of hydrogen passivation on the micro-structure and optical properties of GaAs films was reported. The GaAs thin films were studied by X-ray diffraction,atomic force microscope pattern,absorption and photoluminescence (PL) spectrum.Experimental results show that the GaAs thin films have fcc zinc-blende structure,larger the granular size and more coarseness morphology,when the substrate temperature is at 500℃~520℃ with hydrogen or at 520℃ without hydrogen,a clear exciton hump and blue shift phenomenon were observed in the absorption spectra as well as a stronger peak were found in the PL spectra. These results indicate that hydrogen has passivation effect on GaAs thin films significantly.
    Zhu Huiqun, Ding Ruiqin, Hu Yi. Hydrogen Passivation Effect on GaAs Thin Films[J]. Acta Photonica Sinica, 2006, 35(8): 1194
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