Yongpeng Zhao, Qiang Xu, Qi Li, Qi Wang. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001

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- Chinese Journal of Lasers
- Vol. 45, Issue 11, 1100001 (2018)
Abstract

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