[1] Allan A, Journal of Applied Physics 86, 045406 (2015).
[2] Trache, A and Meininger G, Current Protocols in Microbiology 2 , Unit 2C.2 (2008).
[3] Shen X, Markman A and Javidi B, Applied Optics 56, D151 (2017).
[4] Komatsu S, Markman A, Mahalanobis A, Chen K and Javidi B, Appl. Opt. 9, D120 (2017).
[5] Wang Y, Yang J, Liu L and Yan P, Acta Optica Sinica 39, 1110001 (2019). (in Chinese)
[6] Xiao X, Javidi B, Martinez-Corral M and Stern A, Applied Optics 52, 546 (2013).
[7] Chen X, Song X, Wu J, Xiao Y and Wang Y, Optics and Lasers in Engineering 136, 106314 (2020).
[8] Li D, Cheung C F, Ren M, Zhou L and Zhao X, Optics Express 22, 25635 (2014).
[9] Zhang H, Deng H, He M and Wang Q, Applied Sciences 9, 3852 (2019).
[10] Tabery C, Morokuma H, Sugiyama A and Page L, Evaluation of OPC Quality Using Automated Edge Placement Error Measurement with CD-SEM, International Society for Optics and Photonics, 61521F (2006).
[11] Tanaka M, Meessen J, Shishido C, Watanabe K, Minnaert- Janssen I and Vanoppen P, CD Bias Reduction in CD-SEM Linewidth Measurements for Advanced Lithography, International Society for Optics and Photonics, 69221T (2008).
[12] Xiao-dong Z, Bin W and Zhi-yuan Y, Journal of Measurement Science & Instrumentation 8, 238 (2017).