The wavefront, such as power, astigmatism, coma and spherical aberration distortion etc., was currently generated by Zernike polynomial with the P-V value less than 5λ (1053 nm). Then with the generated wavefront added the continuous phase plate (CPP), which was designed for backlight with the methods of improved Gerchberg-Saxton (G-S) algorithm, the focus process was simulated by fast Fourier transform (FFT) algorithm. The influences of wavefront distortion type and wavefront distortion value on the 3ω (351 nm) shaping focal spots were studied in details through three factors, energy efficiency, the uniformity of the 10～100 μm scale of focus and the size of the focal spot. The results showed it had a relatively wider tolerance for wavefront distortions due to the energy efficiency and the size of the focal spot, the variances will be no more than 5% as the P-V of the generated wavefront distortion was analogous with the CPP. The uniformity of the focal spot was very sensitive to wavefront distortion, with 1λ (1053 nm) wavefront distortion, the root-mean-square (RMS) of focal spots will be increased about 38.5%, from 0.325 to 0.45. Therefore, it indicates that it is necessary to control the wavefront distortions of the whole laser systems.