• Chinese Journal of Lasers
  • Vol. 31, Issue 7, 870 (2004)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Temperature Rise on a Semiconductor Substrate Locally Heated by 10.6 μm Laser Beam[J]. Chinese Journal of Lasers, 2004, 31(7): 870 Copy Citation Text show less
    References

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    [4] P. Loza, D. Kouznetsov, R. Ortega. Temperature distribution in a uniform medium heated by linear absorption of a Gaussian light beam[J]. Appl. Opt., 1994, 33(18):3831~3836

    [5] M. K. Loze, C. D. Wright. Temperature distributions in semi-infinite and finite-thickness media as a result of absorption of laser light[J]. Appl. Opt., 1997, 36(2):494~507

    [9] M. Lax, Temperature rise induced by a laser beam[J]. J. Appl. Phys., 1977, 48(9):3919~3924

    [10] M. R. T. Siregar, W. Lüthy, K. Affolter. Dynamics of CO2 laser heating in the processing of silicon[J]. Appl. Phys. Lett., 1980, 36(10):787~788

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Temperature Rise on a Semiconductor Substrate Locally Heated by 10.6 μm Laser Beam[J]. Chinese Journal of Lasers, 2004, 31(7): 870
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