Diagnosis of kinetic process in silane LPCVD by means of OLD

Fu Guangsheng; Li Xiaowei; Han Li; Zhang Lianshui; Dong Lifang; Lu Furun; Xue Chunyin

Journals >Chinese Journal of Lasers >Volume 14 >Issue 11 >Page 671 > Article

Chinese Journal of Lasers
Vol. 14, Issue 11, 671 (1987)

Diagnosis of kinetic process in silane LPCVD by means of OLD

Fu Guangsheng, Li Xiaowei, Han Li, Zhang Lianshui, Dong Lifang, Lu Furun, and Xue Chunyin

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[in Chinese]

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Fu Guangsheng, Li Xiaowei, Han Li, Zhang Lianshui, Dong Lifang, Lu Furun, Xue Chunyin. Diagnosis of kinetic process in silane LPCVD by means of OLD[J]. Chinese Journal of Lasers, 1987, 14(11): 671 Copy Citation Text

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Abstract

The shock wave in SiH4 laser plasma chemical vapour deposition (LPCVD) are measured byoptoacoustic laser deflection (OLD) technique. The result shows that the shock wars induced by laser gas breakdown is the basic gaa kinetic process in LPGVD. Also discussed is its influence on thin film growth.

Fu Guangsheng, Li Xiaowei, Han Li, Zhang Lianshui, Dong Lifang, Lu Furun, Xue Chunyin. Diagnosis of kinetic process in silane LPCVD by means of OLD[J]. Chinese Journal of Lasers, 1987, 14(11): 671

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