A Phase-Shifting Mask and Double-Laser Beam Interference Exposure Method for Fabrication of Grating in Optic Fibers

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 30 >Issue 1 >Page 5 > Article

Opto-Electronic Engineering
Vol. 30, Issue 1, 5 (2003)

A Phase-Shifting Mask and Double-Laser Beam Interference Exposure Method for Fabrication of Grating in Optic Fibers

[in Chinese]¹, [in Chinese]^1、2, [in Chinese]¹, and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. A Phase-Shifting Mask and Double-Laser Beam Interference Exposure Method for Fabrication of Grating in Optic Fibers[J]. Opto-Electronic Engineering, 2003, 30(1): 5 Copy Citation Text

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