• Chinese Journal of Lasers
  • Vol. 30, Issue s1, 43 (2003)
LI Xiao-wei*, SUN Yu-chen, DONG Li-fang, Yu Wei, and Han Li
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  • [in Chinese]
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    LI Xiao-wei, SUN Yu-chen, DONG Li-fang, Yu Wei, Han Li. Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials[J]. Chinese Journal of Lasers, 2003, 30(s1): 43 Copy Citation Text show less

    Abstract

    On the basis of nucleation and growth model, random sample method was introduced to simulate the formation of silver clusters in silver halide imaging material. Through the analysis of the results, the formation process of silver clusters and their transformation relationship was reappearance. Also, some basic relationship between photoelectronics' behavior and photosensitive process is obtained.
    LI Xiao-wei, SUN Yu-chen, DONG Li-fang, Yu Wei, Han Li. Influence of Photoelectronics’ Behavior on the Photosensitive Process of Imaging Materials[J]. Chinese Journal of Lasers, 2003, 30(s1): 43
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