Jinlong ZHANG, Fumei WANG, Shenghuan FANG, Hongfei JIAO, Xinbin CHENG, Zhanshan WANG. Scattering and mechanical loss of ultra-low loss laser coatings[J]. Optics and Precision Engineering, 2022, 30(21): 2655
- Optics and Precision Engineering
- Vol. 30, Issue 21, 2655 (2022)
Fig. 1. TEM image of Ta2O5-TiO2/SiO2 coating fabricated by ion beam sputtering
Fig. 2. Schematic diagram of interfacial scattering of multilayer
Fig. 3. Surface roughness of low-loss thin film samples from REO Corporation， USA
Fig. 4. Comparison of ARS and TS of QWHR films with fully correlated interface and totally uncorrelated interface
Fig. 5. Extracted 1D interface profiles obtained from high resolution TEM image of Mo/Si multilayer by oblique deposition
Fig. 6. ARS measurement and simulation result at 13.5 nm of Mo/Si multilayer deposited with normal and oblique incidence （α =- 30°）
Fig. 7. Schematic of multilayer mirror fabricated with oblique deposition
Fig. 8. ARS in incident plane for SiO2/Ta2O5 mirrors calculated for G1 （curve 1） and G2 （curve 2） scattering geometries and ARS for the similar mirrors fabricated using deposition at normal incidence
Fig. 9. Sketch of the bi-layer fabricated by oblique deposition of materials（d 1，2ε 1，2 is the permittivity of bi-layer materials）
Fig. 10. ARS in incident plane from SiO2-on-Ta2O5 bi-layers designed to suppress scattering at different scattering angles from 0 to 60°
Fig. 11. The bi-layers are fabricated at different deposition angles（The solid curves are results of ARS measurements and the dashed curves are results of ARS calculation）
Fig. 12. Variation of interfacial electric field before and after adjusting film design
Fig. 13. Fj at interfaces of QWHR coatings for different scattering angles
Fig. 14. Fj at interfaces of LSHR coatings for different scattering angles
Fig. 15. Surface topography and PSD of QWHR， LSHR coatings measured by AFM
Fig. 16. 3D-ARS simulations of QWHR， LSHR coatings
Fig. 17. ARS measurement of QWHR and LSHR coatings of different polarization in plane of incidence
Fig. 18. Schematic diagram of nodule defects
Fig. 19. Geometric model of typical nodule defect
Fig. 20. （a） Randomly distributed positions of nodules； （b） Schematic of far field superposition； （c） 3D elementary contours of electric field determined by amplitude superposition； （d） Intensity superposition
Fig. 21. Simulated and measured ARS of HR coatings with and without artificial nodules at wavelength of 1 064 nm
Fig. 22. Variation of total scattering with nodule size
Fig. 23. Electric field distribution in nodule structures with different seed sizes
Fig. 24. SEM and ARS of HR coatings with seeds and planarized seeds
Fig. 25. Schematic diagram of secondary system structure
Fig. 26. Theoretical curves of mechanical loss of different elements doping with temperature change
Fig. 27. Comparison of mechanical loss of undoped and Ti-doped Ta2O5 thin films at vibration frequency of 1 000 Hz
Fig. 28. Atomic structure modeling of 20.4%Ti-doped Ta2O5 films
Fig. 29. Mechanical loss of Si∶H monolayers before and after annealing
Fig. 30. Actual view of GeNS support part in vacuum chamber
Fig. 31. Mechanical loss of SiO2 monolayer， Ta2O5 monolayer and high-reflection films composed of SiO2 and Ta2O5 stacks after annealing
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