• Acta Physica Sinica
  • Vol. 68, Issue 10, 105202-1 (2019)
Gai-Ling Zhang, Yue Hua, Ze-Yu Hao, and Chun-Sheng Ren*
DOI: 10.7498/aps.68.20190071 Cite this Article
Gai-Ling Zhang, Yue Hua, Ze-Yu Hao, Chun-Sheng Ren. Experimental investigation of plasma parameters in 13.56 MHz/2 MHz cylindrical inductively coupled plasma[J]. Acta Physica Sinica, 2019, 68(10): 105202-1 Copy Citation Text show less
A schematic diagram of the cylindrical inductively coupled plasma reactor.柱状感性耦合等离子体源的实验装置图
Fig. 1. A schematic diagram of the cylindrical inductively coupled plasma reactor.柱状感性耦合等离子体源的实验装置图
Argon plasma emission spectroscopy at 10 Pa for 13.56 MHz radio-frequency discharge. The radio-frequency power is fixed at 400 W and the measurement plane is r = 0 cm.频率为13.56 MHz, 气压为10 Pa, 输入功率为400 W, 腔室中心(r = 0 cm)处氩等离子体发射光谱全谱
Fig. 2. Argon plasma emission spectroscopy at 10 Pa for 13.56 MHz radio-frequency discharge. The radio-frequency power is fixed at 400 W and the measurement plane is r = 0 cm. 频率为13.56 MHz, 气压为10 Pa, 输入功率为400 W, 腔室中心(r = 0 cm)处氩等离子体发射光谱全谱
(a) The electron density and (b) electron temperature of 13.56 MHz/2 MHz discharge at different power. The gas pressure is fixed at 10 Pa and the measurement position is z = 10 cm, r = 0 cm.气压为10 Pa时, 在z = 10 cm, r = 0 cm处, 13.56 MHz/2 MHz放电中等离子体参数随功率的变化 (a)电子密度; (b)电子温度
Fig. 3. (a) The electron density and (b) electron temperature of 13.56 MHz/2 MHz discharge at different power. The gas pressure is fixed at 10 Pa and the measurement position is z = 10 cm, r = 0 cm. 气压为10 Pa时, 在z = 10 cm, r = 0 cm处, 13.56 MHz/2 MHz放电中等离子体参数随功率的变化 (a)电子密度; (b)电子温度
The skin depth versus input power for 13.56 MHz/2 MHz discharge at 10 Pa.气压为10 Pa时, 13.56 MHz/2 MHz放电中趋肤深度随功率的变化
Fig. 4. The skin depth versus input power for 13.56 MHz/2 MHz discharge at 10 Pa.气压为10 Pa时, 13.56 MHz/2 MHz放电中趋肤深度随功率的变化
The radial distribution profiles of electron density for (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 10 Pa and the measurement plane is z = 10 cm.气压为10 Pa时, z = 10 cm处, 13.56 MHz/2 MHz放电中电子密度的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
Fig. 5. The radial distribution profiles of electron density for (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 10 Pa and the measurement plane is z = 10 cm. 气压为10 Pa时, z = 10 cm处, 13.56 MHz/2 MHz放电中电子密度的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
The radial distribution profiles of electron temperature for (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 10 Pa and the measurement plane is z = 10 cm.气压为10 Pa时, 高低频放电中电子温度的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
Fig. 6. The radial distribution profiles of electron temperature for (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 10 Pa and the measurement plane is z = 10 cm. 气压为10 Pa时, 高低频放电中电子温度的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
The radial distribution profiles of metastable states for (a) 13.56 MHz and (b) 2 MHz discharge at 10 Pa.气压为10 Pa时, 高低频放电中亚稳态的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
Fig. 7. The radial distribution profiles of metastable states for (a) 13.56 MHz and (b) 2 MHz discharge at 10 Pa.气压为10 Pa时, 高低频放电中亚稳态的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
The radial distribution profiles of electron density (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 100 Pa and the measurement plane is z = 10 cm.气压为100 Pa时高低频放电中电子密度的径向分布 (a)频率为13.56 MHz; (b)频率为2 MHz
Fig. 8. The radial distribution profiles of electron density (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 100 Pa and the measurement plane is z = 10 cm. 气压为100 Pa时高低频放电中电子密度的径向分布 (a)频率为13.56 MHz; (b)频率为2 MHz
Thenonuniformity at different power for 13.56 MHz/2 MHz discharge. The gas pressure is fixed at 10 Pa and 100 Pa, the measurement plane is z = 10 cm.气压为10 Pa和100 Pa时, 在z = 10 cm处, 高低频放电中径向不均匀度随功率的变化
Fig. 9. Thenonuniformity at different power for 13.56 MHz/2 MHz discharge. The gas pressure is fixed at 10 Pa and 100 Pa, the measurement plane is z = 10 cm. 气压为10 Pa和100 Pa时, 在z = 10 cm处, 高低频放电中径向不均匀度随功率的变化
The electron energy relaxation length versus input power for 13.56 MHz/2 MHz discharge. The gas pressure is fixed at 10 Pa and 100 Pa.气压为10 Pa和100 Pa时, 13.56 MHz/2 MHz放电中电子能量弛豫长度随功率的变化
Fig. 10. The electron energy relaxation length versus input power for 13.56 MHz/2 MHz discharge. The gas pressure is fixed at 10 Pa and 100 Pa.气压为10 Pa和100 Pa时, 13.56 MHz/2 MHz放电中电子能量弛豫长度随功率的变化
The radial distribution profiles of electron temperature (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 100 Pa and the measurement plane is z = 10 cm.气压为100 Pa时高低频放电中电子温度的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
Fig. 11. The radial distribution profiles of electron temperature (a) 13.56 MHz and (b) 2 MHz discharge. The gas pressure is fixed at 100 Pa and the measurement plane is z = 10 cm. 气压为100 Pa时高低频放电中电子温度的径向分布 (a)高频13.56 MHz; (b)低频2 MHz
Gai-Ling Zhang, Yue Hua, Ze-Yu Hao, Chun-Sheng Ren. Experimental investigation of plasma parameters in 13.56 MHz/2 MHz cylindrical inductively coupled plasma[J]. Acta Physica Sinica, 2019, 68(10): 105202-1
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