To realize the electromagnetically induced transparency-like effect on the silicon waveguide, a double ring resonators structure based on silicon-on-insulator was designed and fabricated. By post processing of thermal oxidation annealing under the temperature from 300 ℃ to 1 200 ℃, wet chemical etching with buffered oxide etch and N2 annealing under the temperature of 1 000 ℃, the electromagnetically induced transparency-like curve via the vertical grating coupling method was observed. The effect of different distance between the two resonators to the electromagnetically induced transparency-like curve was analyzed. The Q factor of a single ring in this fabrication was 5.1×104. The measured spectral width of the transparency window was as narrow as 500 MHz.