[1] Park J, Henins I, Herrmann H W, Selwyn G S[J]. J. Appl. Phys., 89, 15(2001).
[3] Walsh J L, Zhang Y T, Iza F, Kong M G[J]. Appl. Phys. Lett., 93, 221505(2008).
[4] Zhang Y T, Li Q Q, Lou J, Li Q M[J]. Appl. Phys. Lett., 97, 141504(2010).
[6] Lou J, Zhang Y T T[J]. IEEE Trans. Plasma Sci., 41, 274(2013).
[7] Balcon N, Hagelaar G J M, Boeuf J P[J]. IEEE Trans. Plasma Sci., 36, 2782(2008).
[9] Laroussi M[J]. Plasma Processes Polym., 2, 391(2005).
[12] Zhang Y T, Chi Y Y, He J[J]. Plasma Processes Polym., 11, 639(2014).
[14] Boeuf J P, Pitchford L C[J]. J. Appl. Phys., 97, 103307(2005).
[15] Farouk T, Farouk B, Gutsol A, Fridman A[J]. Plasma Sources Sci. Technol., 17, 035015(2008).
[16] Zhang Y T, He J[J]. Phys. Plasmas, 20, 013502(2013).
[17] Kwon H C, Jung S Y, Kim H Y, Won I H, Lee J K[J]. Phys. Plasmas, 21, 033511(2014).
[18] He J, Hu J, Liu D W, Zhang Y T[J]. Plasma Sources Sci. Technol., 22, 035008(2013).
[19] Huang X, Sun L Q, Bao Y, Zhang J, Shi J J[J]. Phys. Plasmas, 18, 033503(2011).
[20] Huo W G, Jian S J, Yao J, Ding Z F[J]. Phys. Plasmas, 21, 053505(2014).
[22] Zhang Y T, Liu Y, Liu B[J]. Plasma Sci. Technol., 19, 085402(2017).
[23] Lee M U, Lee J K, Yun G S[J]. Plasma Processes Polym., 15, 1700124(2018).
[24] Wang G, Kuang Y, Zhang Y T[J]. Plasma Sci. Technol., 22, 015404(2020).
[27] Wang Y H, Wang D Z[J]. Acta Phys. Sin., 52, 1694(2003).
[28] Zhang Y T, Wang D Z, Wang Y H[J]. Phys. Plasmas, 12, 103508(2005).
[29] Xu X J, Zhu D C[J]. Discharge Physics of Gas, 277(1996).
[30] Zhang Y T, Wang D Z, Wang Y H[J]. Acta Phys. Sin., 54, 4808(2005).
[31] Lee D, Park J M, Hong S H, Kim Y[J]. IEEE Trans. Plasma Sci., 33, 949(2005).
[32] Zhang Y, Gu B A, Peng X W, Wang D Z, Wang W C[J]. Thin Solid Films, 516, 7547(2008).
[34] Yuan X H, Raja L L[J]. IEEE Trans. Plasma Sci., 31, 495(2003).
[35] Zhang Y T, Wang D Z, Kong M G[J]. J. Appl. Phys., 100, 063304(2006).