• Journal of Advanced Dielectrics
  • Vol. 11, Issue 5, 2160012 (2021)
M. E. Kutepov1、*, G. Ya. Karapetyan1, I. V. Lisnevskaya2, K. G. Abdulvakhidov3, A. A. Kozmin1, and E. M. Kaidashev1
Author Affiliations
  • 1Laboratory of Nanomaterials, Southern Federal University, Stachki, 200/1, 344090 Rostov-on-Don, Russia
  • 2Department of Chemistry, Southern Federal University, Zorge, 7, 344090, Rostov-on-Don, Russia
  • 3Smart Materials Research Institute, Southern Federal University, Sladkova, 178/24, 344090, Rostov-on-Don, Russia
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    DOI: 10.1142/S2010135X21600122 Cite this Article
    M. E. Kutepov, G. Ya. Karapetyan, I. V. Lisnevskaya, K. G. Abdulvakhidov, A. A. Kozmin, E. M. Kaidashev. Optimizing VO2 film properties for use in SAW devices[J]. Journal of Advanced Dielectrics, 2021, 11(5): 2160012 Copy Citation Text show less
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    M. E. Kutepov, G. Ya. Karapetyan, I. V. Lisnevskaya, K. G. Abdulvakhidov, A. A. Kozmin, E. M. Kaidashev. Optimizing VO2 film properties for use in SAW devices[J]. Journal of Advanced Dielectrics, 2021, 11(5): 2160012
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