Study on the process of SiH4breakdown irradiated by frequency tunable TEA CO2laser

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 19 >Issue 8 >Page 624 > Article

Chinese Journal of Lasers
Vol. 19, Issue 8, 624 (1992)

Study on the process of SiH₄breakdown irradiated by frequency tunable TEA CO₂laser

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the process of SiH₄breakdown irradiated by frequency tunable TEA CO₂laser[J]. Chinese Journal of Lasers, 1992, 19(8): 624 Copy Citation Text

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Abstract

The process of SiH4/Ar breakdown irradiated by frequency tunable TEA CO2 laser has been studied. The breakdown threshold of SiH4/Ar has been measured as a funotiou. of laser energy, laser frequency and gas pressure. Based on the experimental results, the physical process of 8iH4/Ar breakdown is proposed to be a process of optic-breakdown through resonant absorption of laser beams.

Keywords

breakdown CO2 laser SiH4 threshold

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